Faux Tie-Dye2 created in #SymmetryMill
Pattern preview:
How to open in SymmetryMill for details (2 more) »
Repository: Library of Congress, Prints and Photographs Division, Washington, D.C. 20540 USA,
Copyright type: Creative Commons Attribution License
Copyright © 2012 by Elaine Polvinen. Permission is hereby granted to use, copy, modify, publish, and distribute these patterns under the terms of the Creative Commons Attribution License.
Direct link to the first pattern tile: (use according to license)
/share/tile/15496c57f347f79
Source image credits:
Library of Congress - Rights Info: No known restrictions on publication.
